INEB
INEB
TitleThe role of composition, morphology and crystalline structure in the electrochemical behaviour of TiN x thin films for dry electrode sensor materials
Publication TypeJournal Article
2009
AuthorsCunha, LT, Pedrosa, P, Tavares, CJ, Alves, E, Vaz, F, Fonseca, C
JournalElectrochimica ActaElectrochim Acta
Volume55
Issue1
Pagination59 - 67
Date Published2009///
00134686 (ISSN)
Anodic currents, Bioelectric phenomena, Biomedical devices, biomedical electrodes, Blocking behaviour, Charge transfer, Charge transfer resistance, Chemical analysis, Crystalline structure, DC reactive sputtering, Dissolution, Dry electrode, EIS, Electrochemical behaviour, Electrochemical corrosion, Electrochemical electrodes, Electrochemical Noise Analysis, Electrochemical studies, Electroencephalographic signals, Ion exchange, morphology, Polarization potential, Porous structures, Selection of the best, Sensor materials, Smooth surface, Sputtering, Thin films, Titanium, Titanium nitride, Titanium substrates, Type structures, Voltammetric analysis
A morphological, structural and electrochemical study of titanium nitride (TiN x) thin films, obtained by DC reactive sputtering on titanium substrates, was carried out for a wide range of compositions (0 < x < 1.34) aiming a selection of the best coatings for dry biomedical electrodes. The films displayed a columnar-type structure, with morphologies strongly dependent on the composition: a compact and smooth surface was found for the Ti-rich films, (x < 1), whereas the N-rich films, (x ≥ 1) displayed a rough and porous structure. The electrochemical study of the TiN x films was performed in synthetic sweat, aiming at simulating the contact with the skin. The voltammetric analysis showed anodic currents higher for TiN x films than for titanium for low and medium polarization potentials, whereas for potentials beyond 2 V the blocking behaviour of the TiN x films allowed them to display lower current values. The passive dissolution currents in the sub-μA/cm 2 range and the charge transfer resistances of the order of the MΩ proved the excellent stability of all films in sweat conditions. Finally, the electrochemical noise analysis showed that the near-stoichiometric and N-rich films display the lowest noise, being therefore the most suitable for electrode applications, where signals in the microvolt range, such as the electroencephalographic (EEG) signals, are to be monitored. © 2009 Elsevier Ltd. All rights reserved.
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